Fabrication of SmFe12/.ALPHA.-Fe Nanocomposite Films by rf-Sputtering onto Heated Substrates.

نویسندگان
چکیده

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

InSb-added TiO2 nanocomposite films by RF sputtering

This study investigates the preparation of InSb-added TiO2 nanocomposite films by RF sputtering. The optical absorption spectra are obviously shifted to visible and near-infrared regions. High-resolution transmission electron microscopy indicates that sphere-shaped InSb nanocrystals with a size of about 15 nm are dispersed in a matrix. The X-ray diffraction result reveals that the matrix forms ...

متن کامل

Eu-doped GaN films grown on sapphire and GaAs substrates by RF magnetron sputtering

The growth of Eu-doped GaN (GaN:Eu) films has been performed on GaAs (100) substrates using RF magnetron sputtering method. The GaN layers exhibit a wurtzite structure. Substrate temperature and the pressure during the deposition do not influence the orientation of GaN:Eu films. After annealing of GaN films in NH3, a strong red luminescence at 622 nm due to Eu ions has been observed.

متن کامل

Characterization of PZT Ferroelectric Thin Films by RF-magnetron Sputtering

By using Radio Frequency (RF) magnetron sputtering method, Pb(Zr0.5Ti0.5)O3 (PZT) thin films were deposited on Pt/Ti/ SiO2/Si substrates. Pt/Ti bottom electrode was fabricated on SiO2/Si substrates by magnetron dual-facing-target sputtering system. Phase and crystalline structure analyses of the PZT films were performed on an X-ray diffraction(XRD), Surface morphology, roughness and particle si...

متن کامل

Nanocrystalline GaN and GaN:H Films Grown by RF-Magnetron Sputtering

The structural and optical properties of nanocrystalline GaN and GaN:H films grown by RF-magnetron sputtering are focused here. The films were grown using a Ga target and a variety of deposition parameters (N2/H2/Arflow rates, RF power, and substrate temperatures). Si (100) and fused silica substrates were used at relatively low temperatures (Ts ≤ 420K). The main effects resulting from the depo...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Journal of the Magnetics Society of Japan

سال: 1999

ISSN: 0285-0192

DOI: 10.3379/jmsjmag.23.1109